Fabrication Techniques for Integrated-Optical Grating-Based Devices
نویسندگان
چکیده
We use a combination of several different types of lithography to generate Bragg-grating devices. In interference lithography, two coherent laser beams are crossed, generating a standing-wave interference pattern. This standing-wave pattern is used to expose photoresist, yielding a coherent deep-submicron-period grating. This grating can be used directly as the device grating or it can serve as a precision reference for later electron-beam lithography steps.
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